Description
We have an open regular position for an expert in the field of high-resolution electron beam lithography. The IBM Research Laboratory in Rüschlikon is currently building a new center for nanotechnology, called NETL (Nanoscale Exploratory Technology Lab), to conduct exploratory and applied research for micro- and nanoelectronics, MEMS/NEMS, nanophotonics, sensors, and post CMOS technologies. The cleanroom facilities within this center will open in early 2011 and will include a new high-resolution electron lithography tool for pattern definition down to the nanometer scale. The open position is available immediately.
The candidate should have an engineering or science degree and a few years' work experience in the field of high-resolution electron beam lithography. The candidate will contribute to tool installation and acceptance and will be responsible for the coordination of all electron beam lithography activities in the new Nanotech center. The cleanroom facility in this center will be shared amongst IBM Research, ETH Zurich and other third parties. The ability to work in an open, multi-cultural environment, good communication and English-language skills are prerequisites.
IBM is committed to diversity at the workplace. Excellent, flexible working arrangements enable both women and men to strike the desired balance between their professional development and their personal lives.
Please send a letter of application detailing your qualification together with a curriculum vitae, a list of publications, three references and any other relevant information to:
Ms. Irene Holenweger Koeb
IBM Research - Zurich
Säumerstrasse 4
8803 Rüschlikon, Switzerland
E-mail: iho@zurich.ibm.com
Application per e-mail is preferred.
For more technical details, please contact Dr. Roland Germann (e-mail: ger@zurich.ibm.com, Tel. +41 (0)44 724 8402).
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