Binnig and Rohrer Nanotechnology Center, IBM Research Zurich

External disturbances

Internal disturbances

External disturbances

Reproduced by permission of The Royal Society of Chemistry

Projects & tools

Characterization. Transmission electron microscopy system

Characterization. Spin-polarized scanning electron microscopy system

Characterization. Raman microscopy system

Fabrication. Electron-beam lithography system

Questions? Contact the expert

Dr. Emanuel Loertscher

Interested in licensing?

Our noise-free lab concept is available for licensing. Please contact us for more details.

Downloads

Fact Sheet Nanotechnology Center [E | D]
Fact Sheet Noise-Free Labs [E | D]

Specifications of noise-free labs

The noise-free laboratories achieve the following specifications, certified by independent external companies.
Parameter	Value
Temperature stability (at rest)	± 0.01 °C / 24 h
Humidity fluctuation	< 3%
Vibrations (RMS, 1/3 octave)	˂ 100 nm/s @ 1 Hz
Acoustic noise (RMS, 1/3 octave)	˂ 21 dBC
Electromagnetic fields	˂ 2 nT (AC) (absolute) < 20 nT (DC) (fluctuations only)

Video

Grab your headphones and experience this immersive 3D sound experience: Sounds of IBM: Noise-free labs.

BBC Arabic interviews IBM Researcher Emanuel Lörtscher: IBM's Noise-Free Labs, BBC Arabic (in Arabic)

Segment begins at 7:00

Details, resources, publications

Ars Technica Goes Inside the World’s "Quietest Room" at IBM’s Zurich Lab, Ars Technica, S. Anthony, 2015.
Was ist Stille?, GEO.de, E. Lörtscher, 2015.
Next-Generation Nanotechnology Laboratories with Simultaneous Reduction of all Relevant Disturbances, Nanoscale, E. Lörtscher et al., 2013.
Silent Labs for Futuristic Nanotechnology, ChemistryWorld News, R. Frame, 2013.
Silence please, atoms are at work inside IBM’s six new ’noise-free’ labs, WIRED, T. Cheshire, 2013.

CNET: Hold very still: Super-quiet rooms permit IBM nano research, cnet, S. Shankland, 2013.
Einblicke in ein neuartiges Laborkonzept. Umfassende Störungsreduktion als Herausforderung, Bulletin online, E. Lörtscher et al., 2011.
Protecting the Tiniest Research. Noise-free labs will foster ultra-sensitive nanoscale experiments, IBM Systems Magazine, M.M. Schultz, 2011.
Tonnenschwere Fundamente für die Nanotech-Forschung, Neue Zürcher Zeitung, G. Müller, 2010.
IBM goes for World Record in "Noise-free" Labs, IEEE Spectrum, D. Johnson, 2010.

Binnig and Rohrer Nanotechnology Center

Besides the state-of-the-art exploratory cleanroom fabrication facility, six “noise-free” labs have been developed by IBM and are currently used for the most sensitive research, where the cleanroom environment would be too “loud”.

These special premises are required for accurate fabrication and characterization at the nanometer scale and beyond. For such research activities, measurements must be screened from building-internal and building-external disturbances.

In total, the six “noise-free” labs have a footprint of roughly 176 m², allowing the operation of highly sensitive measurement equipment and tools for both fabrication and characterization of the tiniest nanoscale structures and most demanding experiments.

“This is a novel laboratory concept that addresses simultaneously all the disturbances relevant for nanotechnology, namely vibrations, electromagnetic fields, temperature, humidity, and sound.”

—Dr. Emanuel Loertscher
Lead scientist, IBM Research

External disturbances

Internal disturbances

Projects & tools

Characterization. Transmission electron microscopy system

Characterization. Spin-polarized scanning electron microscopy system

Characterization. Raman microscopy system

Fabrication. Electron-beam lithography system

Questions? Contact the expert

Dr. Emanuel Loertscher

Interested in licensing?

Downloads

Specifications of noise-free labs

Video

BBC Arabic interviews IBM Researcher Emanuel Lörtscher: IBM's Noise-Free Labs, BBC Arabic (in Arabic)

Details, resources, publications

Besides the state-of-the-art exploratory cleanroom fabrication facility, six “noise-free” labs have been developed by IBM and are currently used for the most sensitive research, where the cleanroom environment would be too “loud”.

These special premises are required for accurate fabrication and characterization at the nanometer scale and beyond. For such research activities, measurements must be screened from building-internal and building-external disturbances.

In total, the six “noise-free” labs have a footprint of roughly 176 m2, allowing the operation of highly sensitive measurement equipment and tools for both fabrication and characterization of the tiniest nanoscale structures and most demanding experiments.

“This is a novel lab­ora­tory con­cept that ad­dress­es simul­tan­e­ous­ly all the dis­tur­bances rel­e­vant for nano­tech­nol­ogy, name­ly vi­bra­tions, elec­tro­mag­net­ic fields, tem­per­a­ture, hu­mid­ity, and sound.”

—Dr. Emanuel LoertscherLead scientist, IBM Research

External disturbances

Internal disturbances

Projects & tools Characterization. Transmission electron microscopy system Characterization. Spin-polarized scanning electron microscopy system Characterization. Raman microscopy system Fabrication. Electron-beam lithography system

Questions? Contact the expert

Dr. Emanuel Loertscher

Interested in licensing?

Downloads

Specifications of noise-free labs

Video

BBC Arabic interviews IBM Researcher Emanuel Lörtscher: IBM's Noise-Free Labs, BBC Arabic (in Arabic)

Details, resources, publications

In total, the six “noise-free” labs have a footprint of roughly 176 m², allowing the operation of highly sensitive measurement equipment and tools for both fabrication and characterization of the tiniest nanoscale structures and most demanding experiments.

“This is a novel laboratory concept that addresses simultaneously all the disturbances relevant for nanotechnology, namely vibrations, electromagnetic fields, temperature, humidity, and sound.”

—Dr. Emanuel Loertscher
Lead scientist, IBM Research

Projects & tools

Characterization. Transmission electron microscopy system

Characterization. Spin-polarized scanning electron microscopy system

Characterization. Raman microscopy system

Fabrication. Electron-beam lithography system